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In the Lilliputian world of nanofabrication, where billions of microscopic circuit elements are sculpted or imprinted on a fingernail-sized silicon chip
Liquids aren’t as well behaved in space as they are on Earth. Inside a spacecraft, microgravity allows liquids to freely slosh and float about. This behavior
Carbon nanomaterials such as carbon nanotubes (CNTs) and graphene have an extraordinary combination of mechanical, electronic and thermal properties that make
Our goal is to develop, advance, and demonstrate measurements that facilitate Nanoimprint Lithography (NIL) as a viable technology for the patterning of robust
The semiconductor industry's remarkable progress in making integrated circuits smaller, faster and cheaper relies on continual improvements in photolithography
Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength
Andrew Madison, John S. Villarrubia, Kuo-Tang Liao, Craig R. Copeland, Joshua Schumacher, Kerry Siebein, Robert Ilic, James Alexander Liddle, Samuel M. Stavis
Adam McCaughan, Alexander N. Tait, Sonia Buckley, Jeff Chiles, Jeff Shainline, Sae Woo Nam, Dylan M. Oh
Computer-aided design (CAD) has become a critical element in the creation of nanopatterned structures and devices. In particular, with the increased adoption of
Li-Anne Liew, David T. Read, May Martin, Todd R. Christenson, John T. Geaney
Photolithographically defined thin film Au dots were used as micro fiducial markers for digital image correlation (DIC), to enable two-dimensional strain
The SUSS MicroTec MA/BA6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 µm. The tool
The JEOL JBX 6300-FS direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with feature