@conference{44341,
  author = {Gregg Gallatin and Patrick Naulleau},
  title = {Modeling the transfer of line edge roughness from an EUV mask to the wafer},
  year = {2011},
  month = {2011-03-25},
  publisher = {Proceedings of the SPIE, San Jose, CA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908144},
  language = {en},
}