TY  - JOUR
AU  - Lei Chen
AU  - Quandou Wang
AU  - Ulf Griesmann
C2  - Microelectronic Engineering
DA  - 2011-08-01
LA  - en
M1  - 88
PB  - Microelectronic Engineering
PY  - 2011
TI  - Plasma Etching Uniformity Control for Making Large and Thick Dual-Focus Zone Plates
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=906649
ER  -