TY  - CONF
AU  - Gregg Gallatin
AU  - Patrick Naulleau
C2  - Proceedings of the SPIE, San Jose, CA
DA  - 2011-03-25
LA  - en
PB  - Proceedings of the SPIE, San Jose, CA
PY  - 2011
TI  - Modeling the transfer of line edge roughness from an EUV mask to the wafer
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908144
ER  -