Optical Radiation Measurements
Charles S. Tarrio
Thomas B. Lucatorto
Please contact the technical staff before shipping instruments or standards to the address listed below.
Fees are subject to change without notice.
Calibration of an EUV detector at 23 wavelengths from 116 nm to 254 nm. Calibration values are the detector responsivity (externally detected electric current per unit incident optical power). For customer-supplied detectors, please contact NIST staff to determine the suitability of the detector for calibration. This test must be ordered in conjunction with test 40710C, EUV Detector Calibration.
New Al2O3 Photoemissive Transfer Standard Detector (40790C)
Issuance of a new photoemissive transfer standard detector consisting of an Al2O3 photocathode, anode structure, and detector body. The detector must be calibrated by specifying one or more of the detector responsivity tests (test numbers 40711C through 40714C) in conjunction with this test.
New Si Transfer Standard Photodiode (40791C)
Issuance of a new Si solid-state photodiode for use as a transfer standard detector. NIST specifications require high radiation hardness and shunt resistance. The detector must be calibrated by specifying one or more of the detector responsivity tests (test numbers 40711C through 40714C) in conjunction with this test.
Special Test in the Extreme Ultraviolet (40799S)
Measurement of EUV properties of a detector or other optical component that does not readily fall under one of the regular tests described above, e.g. spatial uniformity of responsivity, transmission, dependance on bias voltage. Also, responsivity measurements of instruments or subsystems that consist of more than a single photodetector. Please contact NIST staff prior to ordering to discuss the feasibility of the measurement, pricing, availability, and schedule.
References-Detector Calibrations in the Ultraviolet
Stable Silicon Photodiodes for Absolute Intensity Measurements in the VUV and Soft X-Ray Regions, E. M. Gullikson, R. Korde, L. R. Canfield, and R. E. Vest, J. Electron Spectrosc. Relat. Phenon., 80, 313 (1996).
Far Ultraviolet Detector Standards, L. R. Canfield and N. Swanson, J. Res. Natl. Bur. Stand. (U.S.), 92 (2), 97-112 (1987).
NBS Measurement Services: Far Ultraviolet Detector Standards, L. R. Canfield and N. Swanson, Natl. Bur. Stand. (U.S.), Spec. Publ. 250-2 (June 1987).
Time response of NBS windowless XUV radiometric transfer detectors, E. B. Saloman, Appl. Opt. 14, 1764 (1975).References - Extreme Ultraviolet (EUV) Photoresists
Tarrio C.; Grantham S.; Hill S. B.; et al., "A synchrotron beamline for extreme-ultraviolet photoresist testing," REVIEW OF SCIENTIFIC INSTRUMENTS 82, 073102 (2011).
Faradzhev Nadir S.; Yakshinskiy Boris V.; Starodub Elena; et al., "Resonance effects in photoemission from TiO(2)-capped Mo/Si multilayer mirrors for extreme ultraviolet applications," JOURNAL OF APPLIED PHYSICS 109, 083112 (2011).
Grantham S.; Tarrio C.; Hill S. B.; et al., "The NIST EUV facility for advanced photoresist qualification using the witness-sample test," Proceedings of SPIE 7969, 79690K (2011).
Hill S. B.; Faradzhev N. S.; Richter L. J.; et al., "Optics contamination studies in support of high-throughput EUV lithography tools," Proceedings of SPIE 7969, 79690M (2011).
Fedynyshyn Theodore H.; Goodman Russell B.; Cabral Alberto; et al., "Polymer Photochemistry at the EUV Wavelength," Proceedings of SPIE 7639, 76390A (2010).
Garg Rashi; Faradzhev Nadir; Hill Shannon; et al., "A simple null-field ellipsometric imaging system (NEIS) for in situ monitoring of EUV-induced deposition on EUV optics," Proceedings of SPIE 7636, 76361Z (2010).
Hill S. B.; Faradzhev N. S.; Richter L. J.; et al., "Complex species and pressure dependence of intensity scaling laws for contamination rates of EUV optics determined by XPS and ellipsometry," Proceedings of SPIE 7636, 76360E (2010).
Faradzhev N.S.; Hill S.B.; Lucatorto T.B.; et al., "EUV Lithography Optics Contamination and Lifetime Studies," Bulletin of the Russian Academy of Sciences: Physics 74, 28-32 (2010).
Calibrations Phone: 301-975-2200, Fax: 301-975-2950 NIST, 100 Bureau Drive, Stop 8363, Gaithersburg, MD 20899-8363