Advanced Linear and Nonlinear Optical Metrology in support of next-generation Lithography
Last Updated Date: 11/09/2010
High precision linear and nonlinear optics of next-generation lithographic techniques is measured and characterized to enable these technologies. more
Fabrication and Metrology of Novel Magnetic Tunnel Junctions in the Ultra-thin Barrier Limit
Last Updated Date: 10/20/2010
Magnetic tunnel junctions, nanostructured by highly charged ions, are being probed and characterized to establish the foundation for novel … more
Last Updated Date: 10/05/2010
NIST researchers develop simulation tools to support modeling, measurement and fundamental understanding of micromagnetic physics.