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Lei Chen

Lei Chen is a Process Engineer in the NanoFab Operations Group. He received a Ph.D. in Polymer Science and Engineering from Nanjing University in China, and then joined the university’s staff as an Associate Professor. Upon arrival in the United States, Lei joined the Nanostructure Laboratory at Princeton University as a Research Associate, where he focused on novel nanofabrication technology development. Following his time in academia, Lei moved to NanoOpto Corp., leading projects and process development for nano-optical devices. He has broad experience in nanofabrication, self-assembled nanostructures, surface patterning, polymers, and nanocomposites, with over 60 publications and five patents. Lei joined the CNST in 2007, where he is responsible for process development in nanoimprint lithography, plasma etching, atomic layer deposition, and nanostructure characterization.


Selected Publications
  • Motionless phase stepping in X-ray phase contrast imaging with a compact source, H. Miao, L. Chen, E. E. Bennett, N. M. Adamo, A. A. Gomella, A. M. Deluca, A. Patel, N. Y. Morgan, and H. Wen, Proceedings of the National Academy of Sciences of the United States of America 110, 19268–19272 (2013).
    NIST Publication Database        Journal Web Site
  • Spectral line-by-line pulse shaping of on-chip microresonator frequency combs, F. Ferdous, H. Miao, D. E. Leaird, K. Srinivasan, J. Wang, L. Chen, L. T. Varghese, and A. M. Weiner, Nature Photonics 5, 770-776 (2011).
    NIST Publication Database        Journal Web Site
  • Nanofabrication techniques for controlled drug released devices, L. Chen, G. Henein, and V. Luciani, Nanomedicine 6, 1-6 (2011).
    NIST Publication Database        Journal Web Site
  • Cubic silsesquioxanes as a green, high-performance mold material for nanoimprint lithography, H. W. Ro, V. Popova, L. Chen, A. M. Forster, Y. Ding, K. J. Alvine, D. J. Krug, R. M. Laine, and C. L. Soles, Advanced Materials 23, 414-420 (2011).
    NIST Publication Database        Journal Web Site
  • Contact resistance of flexible, transparent carbon nanotube films with metals, H. Xu, L. Chen, L. Hu, and N. Zhitenev, Applied Physics Letters 97, 143116 (2010).
    NIST Publication Database        Journal Web Site
  • Large flexible nanowire grid visible polarizer made by nanoimprint lithography, L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, Applied Physics Letters 90, 063111 (2007).
  • Novel Polymer Patterns Formed by Lithographically Induced Self-Assembly, L. Chen, L. Zhuang, P. Deshpande and S. Chou, Langmuir 3(21), 818 (2005).
  • Kinetics and Mechanism of the Rod-to-Vesicle Transition of Block Copolymer Aggregates in Dilute Solution, L. Chen, H. Shen and A. Eisenberg, Journal of Chemical Physics B 103, 9488-9497 (1999).
Staff Photo - Lei Chen

Position:

Process Engineer
CNST
NanoFab Operations Group

Education:

Ph.D. Polymer Science and Engineering - Nanjing University, China

Contact

Phone: 301-975-2908
Email: lei.chen@nist.gov