Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
In the NanoFab, you can use our extensive commercial, state-of-the-art tool set at economical hourly rates, and get help from a dedicated, full-time technical support staff.
CNST NanoFab Opens Soft Lithography Lab
The CNST NanoFab has established a new soft lithography laboratory. This lab provides researchers with rapid access to tools and processes for fabricating devices in soft materials, with applications ranging from microfluidics and nanofluidics, to flexible electronics and optics, to devices with patterned surface chemistries.
Located in Building 216, room F102, the 25 m2 lab is equipped with a casting station for polydimethylsiloxane (PDMS) coating, a plasma bonder for surface preparation, a convection oven for PDMS baking, and a laminar clean hood for final assembly. The casting station is housed in a fume hood, which also includes a spin coater, a scale, a hot plate, and a desiccator for PDMS mixing, degassing, coating, and baking. The casting station and oven support substrates ranging from 150 mm diameter wafers down to small pieces and the plasma cleaner supports wafers as large as 75 mm in diameter. Over the next 15 months, the CNST NanoFab plans to double the soft lithography lab space to 50 m2 and add tools to improve process reliability and repeatability. The new tools will include a silane vapor deposition tool, a PDMS mixing tool, and a PDMS punch.
To arrange lab access and training, or for more information, please contact Robert Newby, 301-975-6070.
Sputter Cluster System Now Available
A new 4-Wave IBD/BTD cluster sputter deposition system has been installed in the clean room and is now available to users. This tool will provide users physical deposition capability using the ion beam deposition or biased target deposition techniques resulting in the densest available thin films deposited at room temperature. The system has cassette-to-cassette and robot wafer handling, a load lock, and 12 ready-to-deposit materials to provide users clean films deposited on substrates ranging from small pieces up to 200 mm diameter wafers. more...
Direct Write E-Beam Lithography System Now Available
A new JEOL 6300-FS direct write electron beam lithography system has been installed in the clean room, doubling the NanoFab’s capability in e-beam lithography. The new state-of-the-art system offers high resolution exposure capability and accommodates batch handling of substrates. The system is available to users through the NEMO system. more...
Downstream Plasma Asher System Now Available
The CNST has purchased and installed an ULVAC Solutions ENVIRO-1Xa downstream plasma asher which is now available to users. The downstream plasma asher will remove more than 1 µm of photoresist per minute and clean substrates without damaging their surfaces. The tool forms the plasma remotely and, to protect the surfaces, the desired particles are channeled to the wafer to insure that the highest energy ions in the plasma do not impact the substrate. more...
Profilometer System Now Available
The CNST has added a second Bruker Dektak XT profilometer with a motorized X-Y-Θ stage, replacing the older Dektak 6M.In addition to providing step height, surface roughness and waviness measurements, the new profilometer offers wafer mapping and 3-D topological imaging. It can handle small samples and wafers up to 200 mm in diameter. more...