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Microwave Plasma System: PVA Tepla 300

Description:

CORAL Name:  Microwave Asher

A tool using microwave oxygen plasma to remove organics on the surfaces

Specifications / Capabilities:

  • Frequency:  2.45 GHz
  • Power:  100W
  • No Cr, AG exposed to the surface

Scientific Opportunities / Applications:

  • Surface cleaning after processes including ion implant, plasma etching, and sputter etching
  • Surface cleaning of semiconductor wafers after wet etch chemical process
  • Surface cleaning after extended storage
  • Removal of organic passivation layers and resist

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

microwave_asher

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Lei Chen
Phone: 301.975.2908
Email: nanofab_dryetch@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201