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Denton E-beam Evaporator #1

Description:

CORAL Name:  E-Beam Evap 1

This is a dual e-beam/thermal evaporator for the deposition of metal and dielectric thin films. Materials available are: Ag, Al, Au, Co, Cr, Cu, Fe, Gd, Mo, Ni, Pd, Permalloy, Pt, Ta, Ti, W, Y, Yb, Al2O3, C, MgO, Si, SiO2, TiO2.

Specifications / Capabilities:

  • 6-pocket electron gun
  • Two electrodes for thermal sources
  • Wafers from 50 to 150mm
  • Capacity: 4 wafers
  • Cryopumped with a base vacuum of 8E-8T
  • Uniformity shield yielding thickness uniformity of 5% over 100mm wafers

Scientific Opportunities / Applications:

  • Metallization for electrical contacts
  • Dry etch masks
  • Lift-off processes
  • Magnetic studies

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

E-BEAM EVAPORATOR THERMAL INSTRUCTIONS

SCHEDULE TRAINING
ebeam_evap

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Gerard Henein
Phone: 301.975.5645
Email: nanofab_deposition@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201