CORAL Name: Oxford Etcher 2
Oxford Plasmalab 100: Highly flexible plasma etcher to selectively etch Si, SiO2, and SiNx on planar substrates up to 200 mm in diameter under variable temperatures.
Scientific Opportunities / Applications:
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.
Name: Lei Chen