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Laser Lithography: Heidelberg DWL-66FS

Description:

CORAL Name:  Laser Writer

High resolution pattern generator for low volume mask making and direct writing.

Specifications / Capabilities:

  • 1x1 to 6x6 inch square masks
  • 50 to 200mm wafer diameter
  • Structures down to 0.6μm
  • Address grid down to 25nm
  • Top and back-side alignment
  • Auto-focus write heads
  • Accepts DXF, GDS-II, CIF, Gerber, STL formats

Scientific Opportunities / Applications:

  • Micron- and sub-micron lithography
  • Patterning photomask blanks as well as direct patterning of substrates up to 150 mm in diameter

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

Heidelberg DWL-66FS

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Marc Cangemi
Phone: 301.975.5993
Email: nanofab_litho@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201