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Metal RIE 2: Unaxis SHUTTLELINE ICP

Description:

CORAL Name:  Unaxis ICP Etcher

Chlorine-based system utilizing Boron Trichloride and Chlorine to etch metals and III-V group materials on planar substrates up to 150 mm in diameter.

Specifications / Capabilities:

  • ICP:  2.0 MHz 250W
  • RF:  13.56MHz 300W
  • Gases:  Cl2, Ar, BCl3, SF6, O2

Scientific Opportunities / Applications:

  • Anisotropic etching of metal films
  • Etches Chromium, Aluminum, and other Chlorine-based etchable metals
  • Other materials etchable by SF6, Ar, and O2

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

metal_etcher

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Lei Chen
Phone: 301.975.2908
Email: nanofab_dryetch@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201