CORAL Names: SiN LPCVD, Poly LPCVD, LTO LPCVD
This three stack furnace system is utilized to deposit silicon nitride, polysilicon, and low temperature oxide (LTO)
Specifications / Capabilities:
Scientific Opportunities / Applications:
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.
Name: Jerry Bowser