CORAL Name: Unaxis RIE 2
A system based on Oxygen and Fluorine gases to etch polymer and dielectric materials on planar substrates up to 200 mm in diameter.
Specifications / Capabilities:
Scientific Opportunities / Applications:
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.
Name: Lei Chen