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Denton Vacuum Discovery-550 Sputterer

Description:

CORAL Name:  Sputter 2

Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements:

Specifications / Capabilities:

  • Flex-type gun cathodes.  This presents a 3rd axis of adjustment for uniformity tuning and angular plasma presentation.
  • The heating element is no longer a quartz lamp.  The calrod backside assembly is much more stable and the heating uniformity is greatly improved.
  • The PLC control touch screen interface has been improved as PLC/HMI technology has improved.  Also used a Windows PC based system for recipie and data logging options.
  • A three position throttle valve is used to limit conductance during sputtering.
  • One magnetically enhanced gun has been added for ferro-magnetic materials significantly increasing the deposition rates.
  • An option is being considered to obtain a rotating (Lazy-Susan type) of substrate chuck for optimum positioning of the substrate directly below the desired gun.
  • Convenient for multilayers, superlattices, and unattended operations.

Scientific Opportunities / Applications:

  • Metals:  electrical contacts, dry etch masks, nanoplasmonics, magnetic materials
  • Oxides, nitrides:  electrical isolation, etching masks

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

denton550

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Gerard Henein
Phone: 301.975.5645
Email: nanofab_deposition@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201