HMDS (hexamethyldisilzane) promotes photoresist adhesion by creating a bond between the resist and silicon. The silizanes bond to the silicon in the wafer while the methyls bond with the photoresist. Vapor priming allows for HMDS application in a monolayer and reduces the chance of contamination.
Specifications / Capabilities:
Quality of Coating
Efficiency of Chemical Usage
Flexibility of Substrate Size and Shape
Flexibility of Type of Substrate
HMDS is stored in the system under vacuum
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.
Name: Rich Kasica