Ting Xu

Ting Xu is a CNST/UMD Postdoctoral Researcher in the Nanofabrication Research Group. He received a B.S. in Optical Engineering from Nanjing University of Posts and Telecommunications, China, and a Ph.D. in Optics from the Institute of Optics and Electronics at the Chinese Academy of Sciences. His doctoral research focused on characterizing the behavior of surface plasmons in metal-insulator-metal (MIM) nanostructures, and on fabricating MIMs-based nanodevices. Prior to joining NIST, he was a Visiting Research Fellow at the University of Michigan, where he designed and built nanoplasmonic devices. Ting is working with Henri Lezec to design, fabricate, and characterize plasmonic devices and metamaterials for nanoscale measurement applications.

• Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging, T. Xu, Y.-K. Wu, X. Luo, and L. J. Guo, Nature Communications 1, 1058 (2010).
• Efficiency enhancement of organic solar cells using transparent plasmonic Ag nanowire electrodes, M.-G. Kang, T. Xu, H. J. Park, X. Luo, and L. J. Guo, Advanced Materials 22, 4378-4383 (2010).
• Sub-diffraction-limited interference photolithography with metamaterials, T. Xu, Y. Zhao, J. Ma, C. Wang, J. Cui, C. Du, and X. Luo, Optics Express 16, 13579–13584 (2008).