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News and Updates

Projects and Programs

Metrology for Nanoimprint Lithography

Completed
Our goal is to develop, advance, and demonstrate measurements that facilitate Nanoimprint Lithography (NIL) as a viable technology for the patterning of robust

Publications

Defining Chi for Block Copolymer Lithography

Author(s)
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

PHIDL: Python-based layout and geometry creation for nanolithography

Author(s)
Adam McCaughan, Alexander N. Tait, Sonia Buckley, Jeff Chiles, Jeff Shainline, Sae Woo Nam, Dylan M. Oh
Computer-aided design (CAD) has become a critical element in the creation of nanopatterned structures and devices. In particular, with the increased adoption of

Tools and Instruments