The 2015 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) will be held at the Hilton Dresden Downtown in Dresden, Germany, April 14-16, 2015!
Welcome Reception on Monday Evening:
In addition to the previously announced special events, a welcome reception will be held in the Congress Foyer at the Hilton Dresden on Monday evening, Apr. 13th. Please join us for complimentary drinks and snacks from 18:00 to 19:30.
While a city of notable art treasure, architectural sights, and a charming landscape, Dresden also has largest hub of microelectronics in Europe. Dresden is a center of materials science and engineering (more than 2000 materials scientists and engineers at TU Dresden and in several institutes).
The FCMN brings together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference summarizes major issues and provides critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.
We have many outstanding invited speakers confirmed to speak at the conference, including Nobel Prize winner Klaus von Klitzing, Max-Planck-Institut FKF; Suresh Venkatesan, Senior Vice President, Technology Development, Global Foundries; and Hubert Lakner, Executive Director, Fraunhofer Institute for Photonic Microsystems! The full conference program is available on-line. Bios and pictures for many of our invited speakers are available on-line here.
- Alex Braun, "A Jaunt Through Nanotechnopolis,"
"If you want to meet, greet, and learn from the world's experts in metrology, this is the place to be."
- Dan Hutcheson, The Chip Insider,
Start Date: Tuesday, April 14, 2015
End Date: Thursday, April 16, 2015
Location: Hilton Dresden Downtown, Dresden, Germany
Audience: Industry, Government, Academia