The Surface and Nanostructure Metrology Group in the Semiconductor & Dimensional Metrology Division of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST), establishes best-in-the-world SI-traceable length metrology for 3D nanostructures using high-throughput, non-destructive measurement methods with rigorous nanoscale reference metrology. We work closely with leading US semiconductor manufacturers, metrology tool manufacturers and consortia to provide new measurement solutions for critical defect and dimensional metrology needs. We develop the fundamental measurement science and data analysis methods in support of government and US manufacturing where surface roughness, form, and nano-structure topography are critical.
Optical Methods for 3-D Nanostructure Metrology—We develop new approaches to optical microscopy and electromagnetic modeling to enable improved metrology of nanoscale structures with dimensions more than an order of magnitude below traditional …
Traceable Scanning Probe Nano-Characterization—Research and development of rigorously SI traceable nano-characterization instrumentation, measurements, and procedures to enable a fundamental understanding of scanning probe interaction and …
Optical Surface Metrology and Nano-Structured Optics—Aspheric surfaces are indispensable in high-performance optical systems. The ability to accurately manufacture these surfaces to the required shape depends on the ability to measure them. In this …
Atom-Based Dimensional Metrology—A primary goal of this project is to develop intrinsic calibration standards based on the crystalline lattice. The ultimate limit for nanoscale length metrology is the development of intrinsic …
Forensic Topography and Surface Metrology—Provide SI-traceable measurements and standards for ballistic and toolmark identification and surface texture and microform calibrations. Enable innovations in forensic science and manufacturing by …
Physical Measurement Laboratory (PML)