Dr. Hacker is a research chemist and Project Leader in the Nanoelectronics Group in the Semiconductor & Dimensional Metrology Division (683) of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST). She joined NIST in 2002 as a National Research Council (NRC) Postdoctoral Fellow. Her work investigates formation and characterization of monolayers on semiconductors for molecular electronics applications. In addition to developing new measurement techniques, such as p-polarized backside reflection absorption infrared spectroscopy to investigate buried electronic layers, Christina has also been instrumental in developing a novel fabrication technique, flip-chip lamination, which is promising for many next generation electronic structures, including molecular electronics.
Dr. Hacker received her Ph.D. in Analytical Chemistry in 2002 at the University of Wisconsin-Madison studying optical measurements of the electronic interaction of molecular films on silicon surfaces in UHV. Since joining NIST, She has investigated the chemical and physical properties of many molecular monolayers on both metal and semiconductor surfaces and continues to be one of the world's experts in molecular layers on silicon.
Dr. Christina Hacker's general research interests include:
Semiconductor & Dimensional Metrology Division