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Author: Robert Vest

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1. Noble Gas Excimer Scintillation Following Neutron Capture in Boron Thin Films
Published: 4/11/2014
Authors: Alan K Thompson, Jacob McComb, Charles W Clark, Michael A. Coplan, Mohamad Al-Sheikhly, Robert Edward Vest
Abstract: Far-ultraviolet (FUV) scintillation signals have been measured in heavy noble gases (argon, krypton, xenon) following boron-neutron capture (10B(n,α)7Li) in 10B thin films. The observed scintillation yields are comparable to the yields from some ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915257

2. Constant pressure primary flow standard for gas flows from 0.01 cm^u3^/min to 100 cm^u3^/min (10^u-8^ mol/s to 10^u-5^ mol/s)
Published: 12/17/2013
Authors: Robert F Berg, Gooding Timothy, Robert Edward Vest
Abstract: We describe a flow meter for gas flows in the range from 0.01 sccm to 100 sccm with a relative standard uncertainty of 0.03 % at 1 sccm. (1 sccm ≈ 1 cm3/min of an ideal gas at 101325 Pa and 0 C ≈ 0.7 mol/s.) The flow meter calibrates a se ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914154

3. First Report on Quantum Dot Coated CMOS CID Arrays for the UV and VUV
Published: 12/13/2013
Authors: Uwe Arp, Robert Edward Vest, Zoran Ninkov, Ross Robinson, Suraj Bhaskaran
Abstract: A technique has been developed for coating commercial off the shelf (COTS) detector arrays with a thin, uniform layer of quantum dots. The quantum deposition is accomplished using an Optomec Aerosol Jet rapid prototyping system. When illuminated by U ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914748

4. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906750

5. Far-ultraviolet signatures of the 3He(n,tp) reaction in noble gas mixtures
Published: 12/8/2010
Authors: Patrick Hughes, Alan K Thompson, Michael Coplan, Robert Edward Vest, Charles W Clark
Abstract: Previous work showed that the 3He(n,tp) reaction in a cell of 3He at atmospheric pressure generated tens of far-ultraviolet photons per reacted neutron. Here we report amplification of that signal by factors of 1000 and more when noble gases are adde ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906674

6. Tracking down sources of carbon contamination in EUVL exposure tools
Published: 8/3/2009
Authors: Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto, R. Caudillo
Abstract: Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901665

7. At-Wavelength Metrology for EUV Lithography at NIST
Published: 7/14/2009
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

8. Measuring Pulse Energy With Solid-State Photodiodes
Published: 4/10/2009
Authors: Robert Edward Vest, Shannon Bradley Hill, Steven E Grantham
Abstract: With the advent of extreme ultraviolet lithography (EUVL) the measurement of the energy contained in pulses of short-wavelength radiation is becoming increasingly important. Even low average power sources can deliver pulses of radiation with high pea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840222

9. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901663

10. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842436



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