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Author: Shannon Hill

Displaying records 1 to 10 of 15 records.
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1. A synchrotron beamline for extreme-ultraviolet photoresist testing
Published: 9/30/2011
Authors: Charles S Tarrio, Steven E Grantham, Shannon Bradley Hill, Nadir Sabirovich Faradzhev, Lee J Richter, Chester Knurek, Thomas B Lucatorto
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contami ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908231

2. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir Sabirovich Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906750

3. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

4. Measuring Pulse Energy With Solid-State Photodiodes
Published: 4/10/2009
Authors: Robert Edward Vest, Shannon Bradley Hill, Steven E Grantham
Abstract: With the advent of extreme ultraviolet lithography (EUVL) the measurement of the energy contained in pulses of short-wavelength radiation is becoming increasingly important. Even low average power sources can deliver pulses of radiation with high pea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840222

5. Magneto-Optical-Trap-Based, High Brightness Ion Source for Use as a Nanoscale Probe
Published: 8/21/2008
Authors: James L. Hanssen, Shannon Bradley Hill, Jon Orloff, Jabez J McClelland
Abstract: We report on the demonstration of a low emittance, high brightness ion source based on magneto-optically trapped neutral atoms. Our source has ion optical properties comparable to or better than those of the commonly used liquid metal ion source. I ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620601

6. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

7. Saturation effects in solid state photodiodes and impact on EUVL pulse energy measurements,
Published: 1/1/2006
Authors: Robert Edward Vest, Shannon Bradley Hill, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101785

8. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100159

9. Evaluation of alternative capping layers for EUVL mask ML blank, ed. by J.T. Weed and P.M. Martin
Published: 1/1/2005
Authors: P Yan, E Spiller, Eric M Gullikson, Shannon Bradley Hill
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100216

10. Optics go to extremes in EUV lithography
Published: 1/1/2005
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101546



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