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You searched on: Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing

Displaying records 1 to 10 of 47 records.
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1. Quantum Electromechanics on Silicon Nitride Nanomembranes
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/3/2016
Authors: Johannes Fink, Mahmoud Kalaee, Alessandro Pitanti, Richard Norte, Lukas Heinzle, Marcelo Ishihara Davanco, Kartik A Srinivasan, Oskar Painter
Abstract: We present a platform based upon silicon nitride nanomembranes for integrating superconducting microwave circuits with planar acoustic and optical devices such as phononic and photonic crystals. Utilizing tensile stress and lithographic patterning of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=920046

2. Feasibility study on 3-D shape analysis of high-aspect-ratio features using through-focus scanning optical microscopy
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/14/2016
Authors: Ravikiran Attota, Peter Weck, John A Kramar, Bunday Benjamin, Victor H Vartanian
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. Metrology and process control of three-dimensional (3D) high-aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914709

3. Process Optimization for Lattice-Selective Wet Etching of Crystalline Silicon Structures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/9/2016
Authors: Ronald G Dixson, William F Guthrie, Richard A Allen, Ndubuisi George Orji, Michael W. Cresswell, Christine E. Murabito
Abstract: Lattice-selective etching of silicon is used in a number of applications, but it is particularly valuable in those for which the lattice-defined sidewall angle can be beneficial to the functional goals. A relatively small but important niche applica ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919919

4. Simultaneous multiplexed materials characterization using a high-precision hard-X-ray micro-slit array
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/1/2015
Authors: Fan Zhang, Andrew John Allen, Lyle E Levine, Derrick C. Mancini, Jan Ilavsky
Abstract: The needs both for increased experimental throughput and for in-operando characterization of functional materials under increasingly realistic experimental conditions have emerged as major challenges across the whole of crystallography. Aiming to a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917168

5. Rolled-Up Nanoporous Membranes by Nanoimprint Lithography and Strain Engineering
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/7/2015
Authors: Jaehyun Park, ChangKyu Yoon, Qianru Jin, Lei Chen, David H Gracias
Abstract: It is extremely challenging to enable nanoscale patterning in three dimensional (3D) curved geometries using conventional nanolithographic approaches. In this paper, we describe a highly parallel approach that combines nanoimprint lithography (NIL) a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917673

6. Shape-changing magnetic assemblies as high-sensitivity NMR-readable nanoprobes
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/2/2015
Authors: Gary Zabow, Stephen Dodd, Alan Koretsky
Abstract: Fluorescent and plasmonic probes have proven invaluable in the life sciences, but function poorly in optically inaccessible regions. Here we present radio-frequency addressable analogs that afford sensing opportunities similar to those of fluorescent ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917493

7. Challenges, Strategies and Opportunities for Measuring Carbon Nanotubes within a Polymer Composites by X-ray Photoelectron Spectroscopy
Series: Special Publication (NIST SP)
Report Number: 1200-10
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/14/2015
Authors: Justin M Gorham, Jeremiah W Woodcock, Keana C K Scott
Abstract: FOREWORD This NIST Special Publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917794

8. Preparation of silver nanoparticle loaded cotton threads to facilitate measurement development for textile applications
Series: Special Publication (NIST SP)
Report Number: 1200-8
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/26/2015
Authors: Justin M Gorham, Karen E Murphy, Jingyu Liu, Dimitri Tselenchuk, Gheorghe Stan, Thao M. Nguyen, Richard D Holbrook, Michael R Winchester, Robert Francis Cook, Robert MacCuspie, Vincent A Hackley
Abstract: FOREWORD This NIST special publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916567

9. GaN nanowire coated with atomic layer deposition of tungsten: a probe for near-field scanning microwave microscopy
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/26/2014
Authors: Joel C Weber, Paul T Blanchard, Aric Warner Sanders, Jonas Gertsch, Steven George, Samuel Berweger, Atif A. Imtiaz, Thomas M Wallis, Kristine A Bertness, Pavel Kabos, Norman A Sanford, victor bright
Abstract: We report on the fabrication of a GaN nanowire probe for near-field scanning microwave microscopy. The probe has a capacitive resolution of ~0.03 fF, surpassing that of a commercial Pt tip. Imaging of MoS2 sheets found the probe to be immune to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916071

10. Pattern Transfer of Hydrogen Depassivation Lithography Patterns into Silicon with Atomically Traceable Placement and Size Control
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/17/2014
Authors: Josh Ballard, Stephen McDonnell, Don Dick, Maia Bischof, Joseph Fu, D Jaeger, James Owen , w Owen, Justin Alexander, Udi Fuchs, Pradeep Narayanan Namboodiri, Kai Li, John Randall, Robert Wallace, Yves Chabal, Richard Reidy, Richard M Silver
Abstract: Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the masks being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915583



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