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You searched on: Topic Area: Optical Metrology

Displaying records 1 to 10 of 53 records.
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1. Integrated silicon optomechanical transducers and their application in atomic force microscopy
Topic: Optical Metrology
Published: 7/31/2015
Authors: Jie J. Zou, Marcelo Ishihara Davanco, Yuxiang Liu, Thomas Michels, Kartik A Srinivasan, Vladimir A Aksyuk

2. Single-Photon Detector Calibration
Topic: Optical Metrology
Published: 7/7/2015
Author: Sergey V Polyakov
Abstract: In this chapter we introduce the set of detector properties, common to most contemporary detectors, that should be determined for a complete characterization. Then we introduce methods for detector characterization, and finally we present practical ...

3. Experimental Bounds on Classical Random Field Theories
Topic: Optical Metrology
Published: 12/10/2014
Authors: Joffrey Kent Peters, Sergey V Polyakov, Jingyun Fan, Alan L Migdall
Abstract: Alternative theories to quantum mechanics motivate important fundamental tests of our understanding and description of the smallest physical systems. Here we place experimental limits on those classical field theories which result in power-depend ...

4. Single molecule confocal fluorescence lifetime correlation spectroscopy for accurate nanoparticle size determination
Topic: Optical Metrology
Published: 5/15/2014
Authors: Bonghwan B. Chon, Kimberly A Briggman, Jeeseong Hwang
Abstract: We report on an experimental procedure in confocal single molecule fluorescence lifetime correlation spectroscopy (FLCS) to determine the range of excitation power and molecule concentration in solution under which the application of an unmodified ...

5. Practical Use and Calculation of CCT and Duv
Topic: Optical Metrology
Published: 10/18/2013
Author: Yoshihiro Ohno
Abstract: The Correlated Color Temperature (CCT) is often used to represent chromaticity of white light sources, but chromaticity is two-dimensional, and another dimension, the distance from the Planckian locus, is often missing. Duv is defined in ANSI C78.377 ...

6. Fourier Domain Optical Tool Normalization for Quantitative Parametric Image Reconstruction
Topic: Optical Metrology
Published: 9/5/2013
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui Zhou, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology methods that use imaging optics for critical dimension measurements and defect detection. Sensitivity to nanometer scale changes has been observed when measuring critical dimens ...

7. Mode reconstruction of a light field by multi-photon statistics
Topic: Optical Metrology
Published: 7/15/2013
Authors: Elizabeth A Goldschmidt, Fabrizio Piacentini, I. Ruo Berchera, Sergey V Polyakov, Silke Peters, Stefan Kuck, Giorgio Brida, Ivo Pietro Degiovanni, Alan L Migdall, Marco Genovese
Abstract: Knowing the underlying number and structure of occupied modes of a light field plays a crucial role in minimizing loss and decoherence of quantum information. Typically, full characterization of the mode structure involves a series of several separ ...

8. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...

9. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...

10. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...

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