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Topic Area: Optical Metrology
Displaying records 1 to 10 of 100 records.
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1.
TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth
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http://nist.gov/manuscript-publication-search.cfm?pub_id=913667
2.
Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely
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http://nist.gov/manuscript-publication-search.cfm?pub_id=913698
3.
Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois Romain Francis Goasmat, Martin Yeungjoon Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si
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http://nist.gov/manuscript-publication-search.cfm?pub_id=913542
4.
3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912961
5.
SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT
METROLOGY
Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois Romain Francis Goasmat, Hui Zhou, Martin Yeungjoon Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect
detection rates with acceptable throughput and accuracy. With conventional bright-field and dark-
field inspection methods now at their limits, it has b
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http://nist.gov/manuscript-publication-search.cfm?pub_id=913246
6.
Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912781
7.
Nanoscale Specific Heat Capacity Measurements Using Optoelectronic Bilayer Microcantilevers
Topic: Optical Metrology
Published: 12/12/2012
Authors: Brian Gregory Burke, William A Osborn, Richard Swift Gates, David A LaVan
Abstract: We describe a new technique for optically and electrically detecting and heating bilayer microcantilevers (Pt−SiNx) to high temperatures at fast heating rates for nanoscale specific heat capacity measurements. The bilayer microcantilever acts s
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912233
8.
Weak value thermostat with 0.2 mK precision
Topic: Optical Metrology
Published: 12/1/2012
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: A new laser-based thermostat sensitive to 0.2 mK at room temperature is reported. The method utilizes a fluid-filled prism and interferometric weak value amplification to sense nanoradian deviations of a laser beam: due to the high thermooptic coef
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912232
9.
Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Topic: Optical Metrology
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois Romain Francis Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912169
10.
Tunable Supercontinuum Fiber Laser Source for BRDF Measurements in the STARR II Gonioreflectometer
Topic: Optical Metrology
Published: 9/27/2012
Authors: Heather J Patrick, Clarence Joseph Zarobila, Thomas Avery Germer, Victor Alan Ying, Catherine C Cooksey, Benjamin K Tsai
Abstract: STARR II is a planned NIST facility for spectral measurements of specular reflectance and diffuse bidirectional reflectance distribution function (BRDF) that is the follow-on to the current NIST STARR (Spectral Tri-function Automated Reference Reflec
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http://nist.gov/manuscript-publication-search.cfm?pub_id=912019