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You searched on: Topic Area: Manufacturing

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Displaying records 991 to 1000.
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991. Standard Grade Rockwell Diamond Indenters - A Key to a Worldwide Unified Rockwell Hardness Scale (in Japanese)
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Since the 1980''s, the European Community (EC) has established a unified Rockwell C hardness (HRC) scale by averaging several national scales, which come from each country''s national hardness machines and diamond indenters. These ind ...

992. Static Structural Analysis of a Reconfigurable Rigid Platform Supported by Elastic Legs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5885
Topic: Manufacturing
Published: 1/1/1996
Author: F Rudder
Abstract: This report describes a static structural analysis of a rigid planar platform supported by elastic legs. The platform deformations are computed relative to a specified platform position and orientation. The analysis considers deformation due to stati ...

993. Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments
Topic: Manufacturing
Published: 1/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This ...

994. Strut Structure and Rigid Joint Therefor
Topic: Manufacturing
Published: 1/1/1996
Author: James Edward Potzick
Abstract: A highly rigid structure is provided using six struts connected at three upper and three lower nodes to upper and lower support structures. The joint assemblies are formed by half- spherical balls attached to the ends of each of the struts, and retai ...

995. Stylus Flight in Surface Profiling
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: In this paper, theoretical and experimental work on stylus flight is described. Experiments on the surfaces of different roughness specimens with sinusoidal, rectangular, triangular and random waveforms support the theoretical model, which predicts s ...

996. Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM
Topic: Manufacturing
Published: 1/1/1996
Authors: Ronald G Dixson, Theodore Vincent Vorburger, P Sullivan, V W. Tsai, T Mcwaid
Abstract: Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control. Common types of measurements are those of feature spacing (pitch), feature height (or depth), ...

997. Uncertainty Procedure for NIST Surface Finish and Microform Calibration
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: An uncertainty procedure is used for reporting the NIST surface finish and microform calibration uncertainties. The combined standard uncertainty is a combination of the uncertainty from the geometric non-uniformity of the measured surface, and the u ...

998. Using a Potentiostat to Model In-Process Electromechanical Dressing
Topic: Manufacturing
Published: 1/1/1996
Authors: Robert S. Polvani, A Fraker, Christopher J. Evans
Abstract: In-process electrochemical dressing insures true, sharp, stable wheels for efficient ceramic grinding. To better implement electrochemical dressing, we couple laboratory studies based on a potentiostat with shop floor grinding runs. To do this, a cal ...

999. Wavelength-Shift Interferometry: Using a Dither to Improve Accuracy
Topic: Manufacturing
Published: 1/1/1996
Authors: Jack A Stone Jr., Alois Stejskal, Lowell P. Howard
Abstract: A dither in path length can dramatically improve the accuracy of wavelength-shift methods used for absolute distance interferometry. Here we report how a dither improves the accuracy of absolute distance measurement by two orders of magnitude, reduci ...

1000. Visualization of Surface Figure Using Zernike Polynomials
Topic: Manufacturing
Published: 12/1/1995
Authors: Christopher J. Evans, R E. Parks, P Sullivan, John S Taylor
Abstract: Commercial software in modern interferometers used in optical testing frequently fit the wave-front or surface-figure error to Zernike polynomials; typically 37 coefficients are provided. We provide visual representations of these data in a form that ...

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