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Displaying records 991 to 1000.
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991. Frequency Stabilization of a Green He-Ne Laser
Topic: Manufacturing
Published: 8/20/1995
Authors: Jack A Stone Jr., Alois Stejskal
Abstract: A new process for stabilizing the frequency of commercially available 543 nm He-Ne lasers is described. The stabilization method is based on anomalous dispersion of the gain medium. A total of four green lasers have been stabilized - two at the Natio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820775

992. Report of Investigation: Reference Material 8090 - SEM Magnification Calibration Reference Material
Topic: Manufacturing
Published: 8/9/1995
Authors: Michael T Postek, R Gettings
Abstract: Reference Material (RM) 8090 is intended primarily for use in calibrating the magnification scale of a scanning electron microscope (SEM) over a wide range of magnifications, from less than 100X to greater than 300,000X. RM 8090 contains structures i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820806

993. Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure
Topic: Manufacturing
Published: 8/6/1995
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm level of accuracy. Such measurements involve the accurate location of line edges, the subtr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820745

994. Improved Photomask Metrology Through Exposure Emulation
Topic: Manufacturing
Published: 7/1/1995
Author: James Edward Potzick
Abstract: The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some ar ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820757

995. In Situ Testing and Calibrating of Z-Piezo of an Atomic Force Microscope
Topic: Manufacturing
Published: 7/1/1995
Author: Joseph Fu
Abstract: By scanning a slightly tilted, smooth surface with an atomic force microscope (AFM), it is possible to obtain hysteresis loops which contain information on the nonlinearity and hysteresis in the z axis of the AFM''s piezoelectric actuator. A 15% vari ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820740

996. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Topic: Manufacturing
Published: 7/1/1995
Authors: John A Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820733

997. NIST SRM 9983 High Rigidity Ball-Bar Stand User Manual
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5659
Topic: Manufacturing
Published: 6/1/1995
Authors: Daniel S Sawyer, Steven David Phillips, Gregory W Caskey, Bruce R. Borchardt, David E Ward, P Snoots
Abstract: This document is the user manual for the NIST SRM 9983 High Rigidity Ball Bar Stand. The manual contains a list of the components that are included as part of the unit. Complete instructions for setting up and assembling the stand to support a ball b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820762

998. The Gage Block Handbook
Series: Monograph (NIST MN)
Report Number: 180
Topic: Manufacturing
Published: 6/1/1995
Authors: Theodore D Doiron, John S Beers
Abstract: Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820735

999. Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM
Topic: Manufacturing
Published: 5/22/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating vo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820751

1000. Delineation of pn Junctions by Scanning Tunneling Microscopy/Spectroscopy in Air and Ultrahigh Vacuum
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, John A Dagata, H. W. Tseng
Abstract: Lateral dopant profiling of cleaved, passivated abrupt GaAs pn junctions using scanning tunneling microscopy/spectroscopy is demonstrated both in ultrahigh vacuum and air. A combination of forward-and reverse-bias imaging and position-dependent tunn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820764



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