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Displaying records 991 to 1000.
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991. Comprehensive Study of Parameters for Characterizing 3-D Surface Topography IV: Parameters for Characterizing Spatial and Hybrid Properties
Topic: Manufacturing
Published: 11/1/1994
Authors: W Dong, P Sullivan, K Stout
Abstract: This is the last part in a series of reports describing a comprehensive study of parameters to characterize three-dimensional surface topography. In conjunction with other parts of the report, this paper deals with parameters used to characterize spa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820680

992. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer-Practical Implementation
Topic: Manufacturing
Published: 10/1/1994
Authors: P Sullivan, Christopher J. Evans
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820719

993. Dynamics and Structure of Self-Assembled Organic Molecules at the Solid-Liquid Interface
Topic: Manufacturing
Published: 10/1/1994
Authors: J Jorgensen, N Shcmeisser, J Garnaes, L Madsen, K Schaumburg, Larry Hansen
Abstract: We have analysed scanning tunnelling microscopc (STM) images of self-assembled didodecylbenzene (DDB) molecules physisorbed on graphite from a DDB solution using octylbenzene as solvent. The DDB images were obtained alternating with images of the gra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820685

994. Design of an Atomic Force Microscope with Interferometric Position Control
Topic: Manufacturing
Published: 8/19/1994
Authors: J Schneir, T Mcwaid, J Alexander, B Wilfley
Abstract: Advances in the manufacture of integrated circuits, x?ray optics, magnetic read-write heads, optical data storage media, and razor blades require advances in ultraprecision metrology. Each of these industries is currently investigating the use of ato ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820710

995. Dimensional Inspection Planning Based on Product Data Standards
Topic: Manufacturing
Published: 7/1/1994
Author: Shaw C Feng
Abstract: This paper describes an activity model for dimensional inspection planning that bridges the gap between product design and the dimensional measurement of manufactured products. Functionally, this model specifies requirements for developing a part of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821113

996. Radiation Scattered by Two Touching Spheres
Topic: Manufacturing
Published: 6/20/1994
Author: Egon Marx
Abstract: During the manufacture of powder metal, the size distribution of the metal spheres can be determined to some extent by the distribution of light scattered by the spheres while they are streaming by a laser beam. Micrographs show the presence of chain ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820692

997. National Institute of Standards and Technology (NIST) J93 Project Proposal Report
Topic: Manufacturing
Published: 6/15/1994
Authors: Michael T Postek, Robert D. Larrabee, L Linholm, James Edward Potzick, J Schneir, T Mcwaid, Michael W Cresswell, Richard A Allen, E Clayton Teague
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820703

998. A Users' Guide to NIST SRM 2084: CMM Probe Performance Standards
Topic: Manufacturing
Published: 6/1/1994
Authors: Gregory W Caskey, Steven David Phillips, Bruce R. Borchardt, David E Ward, Daniel S Sawyer
Abstract: Standard Reference Materials (SRMs) as defined by the National Institute of Standards and Technology (NIST) are well-characterized materials, produced in quantity and certified for one or more physical or chemical properties. They are used to assure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820674

999. A Monte Carlo Model for SEM Linewidth Metrology
Topic: Manufacturing
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

1000. An Instrument for Calibrating Atomic Force Microscope Standards
Topic: Manufacturing
Published: 5/1/1994
Authors: J Schneir, T Mcwaid, Theodore Vincent Vorburger
Abstract: To facilitate the use of AFMs for manufacturing we have initiated a project to develop and calibrate artifacts which can in turn be used to calibrate a commercial AFM so that subsequent AFM measurement are accurate and traceable back to the wavelengt ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820711



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