Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publications Portal

You searched on: Topic Area: Manufacturing

Your search results exceeded 1,000 records. Please refine your search and try again.
Displaying records 971 to 980 of 1000 records.
Resort by: Date / Title


971. Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts
Topic: Manufacturing
Published: 1/1/1996
Authors: V W. Tsai, Theodore Vincent Vorburger, P Sullivan, Ronald G Dixson, Richard M Silver, Edwin Ross Williams, J Schneir
Abstract: The decreasing feature dimensions required in the semiconductor manufacturing industry are placing ever increasing demands upon metrology instruments. Atomic force microscopes (AFMs), which can have ~1 nm lateral resolution and sub-angstrom vertical ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820827

972. Integral Equation for Scattering by a Rough Surface
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: An equation for an unknown surface field that represents scattering by a rough patch on a flat dielectric surface is presented. The geometrical considerations for this particular problem are discussed, especially in relation to a surface divergence f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820796

973. Laser Trackers: Traceability, Uncertainty and Standardization - A Report to the CMSC
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6061
Topic: Manufacturing
Published: 1/1/1996
Author: Gregory W Caskey
Abstract: During the 1996 CMSC conference, undoubtedly one of the hottest topics was how to achieve traceability for the laser tracker. This paper reviews the concepts of traceability and measurement uncertainty from NIST''s perspective, and explain ho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820833

974. New NIST-Certified Length Microscale
Topic: Manufacturing
Published: 1/1/1996
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a simple one-dimension certified pitch standard (or scale) covering the range 1 um to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrumen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820812

975. Novel Methods for Length Measurement Employing Diode Lasers
Topic: Manufacturing
Published: 1/1/1996
Authors: Jack A Stone Jr., Lowell P. Howard, Alois Stejskal, M Stephens, C Oates, L Hollberg
Abstract: Diode lasers have several unique capabilities for length-measurement applications, arising from properties of the diodes that are much different from those of the venerable helium-neon laser presently used for most interferometric measurements. For e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820823

976. Optical Overlay Metrology at NIST
Topic: Manufacturing
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820818

977. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820798

978. Quest for a Recurrence Relation for Xn
Topic: Manufacturing
Published: 1/1/1996
Author: Amy Singer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820819

979. Relativistic Covariance and the Interpretation of Quantum Mechanics
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: The standard interpretation of quantum mechanics is revised to conform to the relativistic theory based on the many-amplitudes formalism for the N-particle system. The wave function acquires a significance closer to that of the electromagnetic field, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820797

980. SEM Image Sharpness Analysis
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820808



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series