@misc{1271461,
  author = {Felix Kim and Sarah Robinson and Nikolai Klimov and John Henry J. Scott},
  title = {X-ray computed tomography flaw phantom development: stepper photolithography and deep reactive ion etching: Fabrication and reference measurements},
  year = {2025},
  month = {2025-02-18 05:02:00},
  publisher = {Advanced Manufacturing Series (NIST AMS), National Institute of Standards and Technology, Gaithersburg, MD},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=958491},
  doi = {https://doi.org/10.6028/NIST.AMS.100-63},
  language = {en},
}