@conference{1275756,
  author = {Yu-Hsin Kuo and Dylan Matthews and Shinichiro Muramoto and TaeYoung Song and Chengyang Zhang and Xianduo Zhao and Md Rahman and Sanghyun Kang and Andres Aguirre and Seung Lee and Daewon Ha and Sourav Dutta and Theodore Moise and Jayakanth Ravichandran and Shimeng Yu and Alexander Grutter and Suman Datta and Tania Roy and Asif Khan},
  title = {On the Impact of Hydrogen Infiltration into Amorphous Oxide Transistor Performance during Forming Gas Annealing (FGA) and its Mitigation},
  year = {2025},
  month = {2025-03-18 00:03:00},
  publisher = {2025 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), Kyoto, JP},
  language = {en},
}