@conference{754606,
  author = {Nien Zhang and Michael Postek and Robert Larrabee and L Carroll and William Keery},
  title = {New Algorithm for the Measurement of Pitch in Metrology Instruments},
  year = {1996},
  number = {2725},
  month = {1996-05-01 00:05:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA},
  language = {en},
}