@conference{758451,
  author = {James Ehrstein and Curt Richter and Deane Chandler-Horowitz and Eric Vogel and Donnie Ricks and Chadwin Young and Steve Spencer and Shweta Shah and Dennis Maher and Brendan Foran and Alain Diebold and Pui-Yee Hung},
  title = {Thickness Evaluation for 2nm SiO2 Films, a Comparison of Ellipsometric, Capacitance-Voltage and HRTEM Measurements},
  year = {2003},
  month = {2003-09-30 00:09:00},
  publisher = {Characterization and Metrology for ULSI Technology: 2003, Austin, TX, USA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31352},
  language = {en},
}