@conference{766506,
  author = {A. Martin and John Suehle and P Chaparala and P. O'Sullivan and A. Mathewson and C. Messick},
  title = {Assessing MOS Gate Oxide Reliability on Wafer Level with Ramped/Constant Voltage and Current Stress},
  year = {1996},
  month = {1996-12-31 00:12:00},
  publisher = {1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA},
  language = {en},
}