@article{766666,
  author = {S. Seraphin and S. Krause and Peter Roitman and David Simons and B. Cordts},
  title = {Effect of Annealing Ambient on the Removal of Oxide Precipitates in High-Dose Oxygen-Implanted Silicon},
  year = {1991},
  number = {59},
  month = {1991-12-02 00:12:00},
  publisher = {Applied Physics Letters},
  language = {en},
}