@conference{767361,
  author = {P Chaparala and John Suehle and C. Messick and M. Roush},
  title = {Time-Dependent Dielectric Breakdown of Intrinsic SiO<sub>2</sub> Films Under Dynamic Stress},
  year = {1996},
  month = {1996-12-31 00:12:00},
  publisher = {1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA},
  language = {en},
}