TY  - GEN
AU  - Jerke, John M
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1980-01-01 05:01:00
DO  - https://doi.org/10.6028/NBS.SP.400-43
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1980
TI  - Accurate linewidth measurements on integrated-circuit photomasks:
ER  -