TY  - GEN
AU  - Hastie, J W
AU  - Bonnell, D W
AU  - Schenck, P K
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1984-01-01 05:01:00
DO  - https://doi.org/10.6028/NBS.IR.84-2983
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1984
TI  - Molecular basis for laser-induced vaporization of refractory materials:
ER  -