TY  - GEN
AU  - Belzer, Barbara J
AU  - Blackburn, David L
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1997-01-01 05:01:00
DO  - https://doi.org/10.6028/NIST.SP.400-99
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1997
TI  - Semiconductor measurement technology ::the results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon
ER  -