TY  - GEN
AU  - Evans, C J
AU  - Davies, A D
AU  - Parks, R E
AU  - Shao, L-Z
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 2000-01-01 05:01:00
DO  - https://doi.org/10.6028/NIST.IR.6701
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 2000
TI  - Interferometric metrology of photomask blanks::approaches using 633 nm wavelength
ER  -