TY  - GEN
AU  - Kim, Felix
AU  - Robinson, Sarah
AU  - Klimov, Nikolai
AU  - Scott, John Henry J.
C2  - Advanced Manufacturing Series (NIST AMS), National Institute of Standards and Technology, Gaithersburg, MD
DA  - 2025-02-18 05:02:00
DO  - https://doi.org/10.6028/NIST.AMS.100-63
LA  - en
PB  - Advanced Manufacturing Series (NIST AMS), National Institute of Standards and Technology, Gaithersburg, MD
PY  - 2025
TI  - X-ray computed tomography flaw phantom development: stepper photolithography and deep reactive ion etching: Fabrication and reference measurements
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=958491
ER  -