TY  - CONF
AU  - Bajcsy, Peter
AU  - Wiseman, Brycie
AU  - Majurski, Michael Paul
AU  - Vladar, Andras
C2  - SPIE conference: Advanced Lithography + Patterning, San Jose, CA, US
DA  - 2025-03-14 04:03:00
LA  - en
PB  - SPIE conference: Advanced Lithography + Patterning, San Jose, CA, US
PY  - 2025
TI  - Detection limits of AI-based SEM dimensional metrology
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=958576
ER  -