TY  - CONF
AU  - Barnes, Bryan
AU  - Chew, Aaron
AU  - Jenkins, Nicholas
AU  - Shao, Yunzhe
AU  - Sohn, Martin
AU  - Kline, Regis
AU  - Sunday, Daniel
AU  - Balakrishnan, Purnima
AU  - Germer, Thomas
AU  - Grantham, Steven
AU  - Klein, Clay
AU  - Moffitt, Stephanie
AU  - Shirley, Eric
AU  - Kapteyn, Henry
AU  - Murnane, Margaret
C2  - Metrology, Inspection, and Process Control XXXIX, San Jose, CA, US
DA  - 2025-04-24 04:04:00
DO  - https://doi.org/10.1117/12.3050342
LA  - en
M1  - 13426
PB  - Metrology, Inspection, and Process Control XXXIX, San Jose, CA, US
PY  - 2025
TI  - Lab-based multi-wavelength EUV diffractometry for critical dimension metrology
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=959709
ER  -