TY  - JOUR
AU  - Kang, Shuhui
AU  - Prabhu, Vivek
AU  - Vogt, B
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Turnquest, Karen
C2  - Abstracts SPIE
DA  - 2006-07-25
LA  - en
PB  - Abstracts SPIE
PY  - 2006
TI  - Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852550
ER  -