TY  - JOUR
AU  - Lisiansky, M
AU  - Heiman, A
AU  - Kovler, M
AU  - Fenigstein, A
AU  - Roizin, Y
AU  - Gladkikh, A
AU  - Iksman, M
AU  - Edrei, R
AU  - Hofman, A
AU  - Shnieder, Y
AU  - Claasen, T
C2  - Applied Physics Letters
DA  - 2006-10-09
LA  - en
M1  - 89
PB  - Applied Physics Letters
PY  - 2006
TI  - SiO2/Si3N4/Al2O3 stacks for scaled-down memory devices: Effects of interfaces and thermal annealing
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854203
ER  -