TY  - CONF
AU  - Jablonski, E
AU  - Angelopoulos, M
AU  - Ito, H
AU  - Lenhart, Joseph~undefined~undefined~undefined~undefined~undefined
AU  - Sambasivan, S
AU  - Fischer, Daniel
AU  - Jones, Ronald
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Goldfarb, D
AU  - Temple, K
C2  - Characterization and Metrology for ULSI Technology, International Conference | | Characterization and Metrology for ULSI Technology: 2003 International Conference on Characterization and Metrology for ULSI Technology | AIP
DA  - 2003-09-01
LA  - en
M1  - 683
PB  - Characterization and Metrology for ULSI Technology, International Conference | | Characterization and Metrology for ULSI Technology: 2003 International Conference on Characterization and Metrology for ULSI Technology | AIP
PY  - 2003
TI  - NEXAFS Measurements of the Surface Chemistry of Chemically Amplified Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852164
ER  -