TY  - CONF
AU  - Tarrio, Charles
AU  - Lucatorto, Thomas
AU  - Grantham, S
AU  - Squires, M
AU  - Arp, Uwe
AU  - Deng, Lu
C2  - Emerging Lithographic Technologies V, Santa Clara, CA
DA  - 2001-12-01
LA  - en
M1  - 4506
PB  - Emerging Lithographic Technologies V, Santa Clara, CA
PY  - 2001
TI  - Upgrades to the NIST/DARPA EUV Reflectometry Facility
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841579
ER  -