TY  - JOUR
AU  - Kline, Regis
AU  - Sunday, Daniel
AU  - Windover, Donald
AU  - Benjamin, Bunday
C2  - Journal of Micro/Nanolithography, MEMS, and MOEMS
DA  - 2017-02-08
LA  - en
PB  - Journal of Micro/Nanolithography, MEMS, and MOEMS
PY  - 2017
TI  - X-ray Scattering Critical Dimensional Metrology using a Compact X-ray Source for Next Generation Semiconductor Devices
ER  -