TY  - CONF
AU  - Sohn, Martin
AU  - Lee, Dong
AU  - Barnes, Bryan
AU  - Dixson, Ronald
AU  - Silver, Richard
AU  - Choi, Sang-Soo
C2  - SPIE Photomask Technology, Monterey, CA
DA  - 2017-11-08
DO  - https://doi.org/10.1117/12.2280782
LA  - en
M1  - 10451
PB  - SPIE Photomask Technology, Monterey, CA
PY  - 2017
TI  - Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy
ER  -