TY  - JOUR
AU  - Josell, Daniel
AU  - Bonevich, John
AU  - Moffat, Thomas
C2  - Electrochemical and Solid State Letters
DA  - 2006-10-01
LA  - en
PB  - Electrochemical and Solid State Letters
PY  - 2006
TI  - Iridium Barriers for Direct Copper Electrodeposition in Damascene Processing.
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901778
ER  -