TY  - JOUR
AU  - Roshko, Alexana
AU  - Springer, Jaclyn
AU  - Steven, 
AU  - Cavanagh, Andrew
AU  - Sun, Huaxing
AU  - Blanchard, Paul
C2  - Journal of Physical Chemistry C
DA  - 2018-03-29
DO  - https://doi.org/10.1021/acs.jpcc.8b00796
LA  - en
M1  - 122
PB  - Journal of Physical Chemistry C
PY  - 2018
TI  - Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Boron Nitride Thin Films at Room Temperature and 100°C
ER  -